A mask built around Niacinamide and Vitamin C derivative, for hydration and barrier repair.
A mask built around Mineral sunscreen and Niacinamide, for barrier repair and hydration.
Brand price
USD 15.00 · checked 26 Sept 2026 · brand's site
Brand price
AUD 29.90 · checked 5 Oct 2026 · brand's site
At a Glance
They come out differently on Fragrance-free and Pore-clogger-free; those rows are shaded. Tap any answer to see why.
Key Ingredients
Mineral sunscreen1
Uses zinc oxide or titanium dioxide to absorb and scatter UV rays.
Centella asiatica (Cica)1
Centella asiatica (cica), used to calm irritation.
Benefits
Hydrating6
Boosts hydration and relieves dry, tight skin.
Butylene Glycol, Ceramide NP, Hyaluronic Acid, Hydroxyethyl Urea, Methyl Gluceth-20, Polyglutamic Acid
Barrier Repair5
Strengthens and restores the skin's natural barrier.
Allantoin, Centella Asiatica Extract, Ceramide NP, Niacinamide, Sodium Polyacrylate
Reduces Irritation3
Eases discomfort and supports skin resilience.
Redness Reducing4
Soothes visible redness and calms irritation.
Allantoin, Bisabolol, Centella Asiatica Extract, Niacinamide
Hydrating8
Boosts hydration and relieves dry, tight skin.
Acetyl Glucosamine, Beta-Glucan, Butylene Glycol, Camellia Sinensis Leaf Extract, Diglycerin, Glycerin, Scutellaria Baicalensis Root Extract, Stearic Acid
Barrier Repair9
Strengthens and restores the skin's natural barrier.
Avena Sativa Seed Extract, Camellia Sinensis Leaf Extract, Caprylyl Glycol, Centella Asiatica Extract, Cetearyl Olivate, Glycerin, Glycyrrhiza Glabra Root Extract, Niacinamide, Stearic Acid
Reduces Irritation7
Eases discomfort and supports skin resilience.
Avena Sativa Seed Extract, Beta-Glucan, Camellia Sinensis Leaf Extract, Centella Asiatica Extract, Chamomilla Recutita Flower Extract, Glycyrrhiza Glabra Root Extract, Scutellaria Baicalensis Root Extract
Redness Reducing5
Soothes visible redness and calms irritation.
Centella Asiatica Extract, Chamomilla Recutita Flower Extract, Glycyrrhiza Glabra Root Extract, Niacinamide, Scutellaria Baicalensis Root Extract
Concerns
May Worsen Seborrheic Dermatitis4
May feed the yeast involved in seborrheic dermatitis.
Ceramide NP, Hydrogenated Lecithin, PEG-60 Hydrogenated Castor Oil, Polysorbate 60
May Worsen Seborrheic Dermatitis5
May feed the yeast involved in seborrheic dermatitis.
Acetyl Glucosamine, Cetearyl Olivate, PEG-40 Hydrogenated Castor Oil, Sorbitan Olivate, Stearic Acid
May Worsen Keratosis Pilaris1
May clog follicles or strip skin prone to keratosis pilaris.
Ingredients Side-by-side
Water (in both products)
Skin Conditioning
Niacinamide (in both products)
Smoothing
0 / —
- Niacinamide
- Acne Fighting
- Barrier Repair
- Brightening
- Dark Spots
- Even Tone
- Oil Control
- Pore Refining
- Redness Reducing
Solvent
Skin Conditioning
Antioxidant
Humectant
Humectant
Water (in both products)
Skin Conditioning
Skin Conditioning
Fragrance
Abrasive
Cleansing
2-3 / 0
- Fatty acids (stearic, oleic, lauric)
- Fatty alcohols (Malassezia)
- Possibly animal-derived
- May Trigger Acne
- May Worsen Keratosis Pilaris
- May Worsen Seborrheic Dermatitis
Humectant
Ingredients Explained
These ingredients are found in both products.
Ingredients higher up in an ingredient list are typically present in a larger amount.
Water
Antiplaque, Skin Conditioning, Solvent
Aqua (EU),Deionized Water,Distilled Water,Micromatrix Fractile AN,Onsen-Sui (JPN),Purified Water
Learn more about Water →Niacinamide
Smoothing
Niacinamide is niacinamide.
Learn more about Niacinamide →Butylene Glycol
Fragrance, Humectant, Skin Conditioning, Solvent, Viscosity Controlling
Butane-1,3-diol (CAS No. 107-88-0/ EC No. 203-529-7) (R)-(-)-butane-1,3-diol” (CAS No. 6290-03-5/ EC No. 228-532-0)
Learn more about Butylene Glycol →Ethylhexylglycerin
Deodorant, Skin Conditioning
Ethylhexylglycerin is the organic compound that conforms to the formula
Learn more about Ethylhexylglycerin →Centella Asiatica Extract
Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic
Centella Asiatica Extract is centella (cica).
Learn more about Centella Asiatica Extract →
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